Fractal roughness of polymers after lithographic processing

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Technological Educational Institute of Athens
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2005 (EN)
Fractal roughness of polymers after lithographic processing (EN)

Πάτσης, Γεώργιος Π. (EL)
Σαρρής, Βασίλειος (EL)
Γογγολίδης, Ευάγγελος (EL)
Τσερέπη, Αγγελική Δ. (EL)
Κωνσταντούδης, Βασίλειος (EL)

Διακουμάκος, Κωνσταντίνος Δ. (EL)
Βαλαμόντες, Ευάγγελος Σ. (EL)
N/A (EN)

The morphology of photoresist polymer surfaces fabricated by lithographic processes is shown to exhibit self-affine behavior for a specific range of scales. The roughness parameters appropriate for the characterization of self-affine surfaces (surface width ω, correlation length χ and roughness exponent α) are found to depend on the exposure dose (i.e. the solubility) involved in the lithography process and to be correlated. A similar dependence and correlation is extracted from a Monte-Carlo simulation of polymer dissolution, thus indicating the pronounced contribution of the dissolution process to the formation of lithographic roughness. The self-affinity and the correlated behavior of the roughness parameters is a general phenomenon for dissolving polymers of varying solubility and not limited to the lithographic process. (EN)


Polymer dissolution (EN)
Fractal surfaces (EN)
Lithography (EN)
Στοχαστική προσομοίωση (EN)
Self-affinity (EN)
Λιθογραφία (EN)
Stochastic simulation (EN)
Φωτοαντιστάτης (EN)
Πολυμερής διάλυση (EN)
Monte-Carlo simulation (EN)
Προσομοίωση Monte-Carlo (EN)
roughness (EN)
Photoresists (EN)
Τραχύτητα (EN)

ΤΕΙ Αθήνας (EL)
Technological Educational Institute of Athens (EN)

Japanese Journal of Applied Physics, Part 2: Letters (EN)



DOI: 10.1143/JJAP.44.L186

Japan Society of Applied Physics (EN)

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