A review of line edge roughness and surface nanotexture resulting from patterning processes

 
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2006 (EN)
A review of line edge roughness and surface nanotexture resulting from patterning processes (EN)

Πάτσης, Γεώργιος (EL)
Τσερέπη, Αγγελική (EL)
Γογγολίδης, Ευάγγελος (EL)
Κωνσταντούδης, Βασίλειος (EL)

N/A (EN)

The importance of surface and sidewall roughness in nanotechnology is discussed and a roughness study framework is presented. The framework is based on the interaction triangle: application, characterization and material processing. An overview of roughness characterization and metrology as well as line edge roughness (LER) resulting from nanolithography is presented. Examples of plasma induced roughness and nanotexturing are given for polydimethylsiloxane and silicon surfaces. (EN)

journalArticle

Material processing (EN)
LER (EN)
Επεξεργασία υλικού (EN)
Νανοτεχνολογία (EN)
Nanotechnology (EN)

ΤΕΙ Αθήνας (EL)
Technological Educational Institute of Athens (EN)

Microelectronic Engineering (EN)

English

2006-04

DOI: 10.1016/j.mee.2006.01.162

Elsevier (EN)



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