Roughness characterization in positive and negative resists

 
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2002 (EN)
Roughness characterization in positive and negative resists (EN)

Διακουμάκος, Κωνσταντίνος Δ. (EL)
Βαλαμόντες, Ευάγγελος Σ. (EL)
Γογγολίδης, Ευάγγελος (EL)
Τσερέπη, Αγγελική Δ. (EL)
Κωνσταντούδης, Βασίλειος (EL)

N/A (EN)

Different roughness parameters, such as the root mean square deviation (rms or σ), the correlation length Lcor, the fractal dimension D and the Fourier spectrum, are presented and compared. The scaling behavior of σ determining the Lcor as well as the dependence of σ and D on the exposure dose for two negative tone (wet- and plasma-developed) and one positive tone resist are investigated. The experimental analysis reveals an interesting interrelation (inverse behavior) between σ and D which is not predicted by theory, and elucidates the dependence of Lcor on the exposure dose. (EN)

journalArticle

Fractal διάσταση (EN)
roughness (EN)
Resists (EN)
Metrology (EN)
Μετρολογία (EN)
Ανθεκτικό (EN)
Τραχύτητα (EN)
Μήκος συσχέτισης (EN)
Correlation length (EN)
fractal dimensions (EN)

ΤΕΙ Αθήνας (EL)
Technological Educational Institute of Athens (EN)

Microelectronic Engineering (EN)

English

2002-07

doi:10.1016/S0167-9317(02)00424-0

Elsevier (EN)



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