A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models

 
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2005 (EN)
A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models (EN)

Μπουντούβης, Ανδρέας (EL)
Σαρρής, Β. (EL)
Πάτσης, Γεώργιος (EL)
Γογγολίδης, Ευάγγελος (EL)
Κωνσταντούδης, Βασίλειος (EL)

N/A (EN)

journalArticle

Φωτοαντίσταση (EN)
Photoresistance (EN)
Πολυμερισμός (EN)
Polymerization (EN)
Μοριακό βάρος (EN)
Molecular weight (EN)

ΤΕΙ Αθήνας (EL)
Technological Educational Institute of Athens (EN)

Japanese Journal of Applied Physics (EN)

English

2005-10-11

DOI: 10.1143/JJAP.44.7400

The Japan society of Applied Physics (EN)



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