Characterization and simulation of surface and line-edge roughness in photoresists

 
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2001 (EN)
Characterization and simulation of surface and line-edge roughness in photoresists (EN)

Πάτσης, Γεώργιος Π. (EL)
Βαλαμόντες, Ευάγγελος Σ. (EL)
Γογγολίδης, Ευάγγελος (EL)
Τσερέπη, Αγγελική Δ. (EL)
Κωνσταντούδης, Βασίλειος (EL)

N/A (EN)

An overview is given on the problem of roughness in photoresists. Focus is on the inspection of three relevant aspects: quantitative characterization, dependence on some material properties and process conditions, and molecular simulations. (EN)

journalArticle

Fractal διάσταση (EN)
Fractal dimension (EN)
Negative tone epoxy resists (EN)
Απόκλιση μέσης τετραγωνικής ρίζας (EN)
Γεννήτρια συγκέντρωσης φωτοξέων (EN)
Root mean square deviation (EN)
Line-edge roughness (EN)
Προσομοιωτής μοριακού τύπου (EN)
Photoacid generator concentration (EN)
Molecular type simulator (EN)

ΤΕΙ Αθήνας (EL)
Technological Educational Institute of Athens (EN)

Journal of Vacuum Science and Technology B (EN)

English

2001-11

DOI: 10.1116/1.1420582

American Institute of Physics (EN)



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