Surface and line-edge roughness in solution and plasma developed negative tone resists

 
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2000 (EN)
Surface and line-edge roughness in solution and plasma developed negative tone resists (EN)

Πάτσης, Γεώργιος Π. (EL)
Γλέζος, Νίκος Μ. (EL)
Τσερέπη, Αγγελική Δ. (EL)
Γογγολίδης, Ευάγγελος (EL)
Ράπτης, Ιωάννης Α. (EL)

Βαλαμόντες, Ευάγγελος Σ. (EL)
N/A (EN)

A framework for the study of surface roughness and line-edge roughness was presented. Experimental results from siloxane resists showed that such systems had the potential of very low surface roughness. A description of surface roughness and line-edge roughness simulation was also given. It was possible to simulate the change of roughness with dose, development time, acid diffusion length, PAG concentration, and polymer structure. (EN)

journalArticle

Αντιανακλαστικές επιστρώσεις (EN)
Computer simulation (EN)
Surface roughness (EN)
Μικροδομή (EN)
Μικροηλεκτρονική (EN)
Microelectronics (EN)
Plasmas (EN)
Πλάσμα (EN)
Microstructure (EN)
Επιφανειακή τραχύτητα (EN)
Υπολογιστική προσομοίωση (EN)
Antireflection coatings (EN)

ΤΕΙ Αθήνας (EL)
Technological Educational Institute of Athens (EN)

Journal of Vacuum Science and Technology B (EN)

English

2000-11

DOI: 10.1116/1.1321281

American Institute of Physics (EN)



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