Thickness determination of thin films based on X-ray signal decay law

 
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1998 (EN)
Thickness determination of thin films based on X-ray signal decay law (EN)

Νασιοπούλου, Ανδρούλα Γ. (EL)
Γλέζος, Νίκος Μ. (EL)
Βαλαμόντες, Ευάγγελος Σ. (EL)
Καλτσάς, Γρηγόριος (EL)

N/A (EN)

A non-destructive method for evaluation of the thickness of films over bulk substrates is presented. This method is based on evaluation of the parameters of the decay part of the x-ray signal ratio. For a selected energy range of each film thickness it is demonstrated that the decay part follows an exponential law. The physical parameters involved in this law are the energy exponent and a constant that depends mainly upon the film thickness. The values found for the energy exponent are in the range 2.0-3.0. This is confirmed in a variety of cases (Al/Si, Ti/Si, Cu/Si, Pt/Si, Cu/Ni, Ti/Au and Pt/Au) for film thicknesses larger than a critical value. The experimental results are compared to those obtained by two theoretical methods and a Monte-Carlo approach. The first method is based on solution of the Boltzmann transport equation for the electron beam, an approach developed by one of the authors for e-beam lithography. The second is based on a previously developed semi-empirical formula for the x-ray depth distribution function. The energy dependence of the signal ratio is also discussed using this approach. (EN)

journalArticle

Electron probe microanalysis (EN)
Boltzmann εξίσωση μεταφοράς (EN)
Electron beam lithography (EN)
Boltzmann transport equation (EN)
Λιθογραφία ηλεκτρονικής δέσμης (EN)
Mathematical models (EN)
Μαθηματικά μοντέλα (EN)
Ηλεκτρονικός ανιχνευστής μικροανάλυσης (EN)

ΤΕΙ Αθήνας (EL)
Technological Educational Institute of Athens (EN)

Surface and Interface Analysis (EN)

English

1998-11


Wiley (EN)



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