Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists

 
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2004 (EN)
Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists (EN)

Πάτσης, Γεώργιος (EL)
Κωνσταντούδης, Βασίλειος (EL)
Leunissen, Leonardus H. A. (EN)
Pollentier, Ivan (EN)
Ercken, Monique (EN)

Γογγολίδης, Ευάγγελος (EL)
N/A (EN)

conferenceItem
poster

Χωρικές συχνότητες (EN)
LER (EN)
Νανοτεχνολογία (EN)
Nanotechnology (EN)
Spatial frequencies (EN)

ΤΕΙ Αθήνας (EL)
Technological Educational Institute of Athens (EN)

Metrology, Inspection, and Process Control for Microlithography XVIII (EN)

English

2004-02-22

DOI: 10.1117/12.537339

SPIE (EN)



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