Simulation of surface and line-edge roughness formation in resists

 
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2001 (EN)
Simulation of surface and line-edge roughness formation in resists (EN)

Πάτσης, Γεώργιος (EL)
Γογγολίδης, Ευάγγελος (EL)

N/A (EN)

A molecular-type simulation of surface (SR) and line-edge-roughness (LER) is presented and applied to a negative-tone Chemically Amplified Resist (CAR). The simulator can follow the appearance of SR and LER after each process step and predict the roughness dependence on material properties and process conditions. The simulation results are compared with SR experimental data for a negative-tone chemically amplified epoxy resist. (EN)

journalArticle

LER (EN)
Surface roughness (EN)
Μικροηλεκτρονική (EN)
Microelectronics (EN)
Τραχύτητα επιφάνειας (EN)
Applied physics (EN)
Εφαρμοσμένη φυσική (EN)

ΤΕΙ Αθήνας (EL)
Technological Educational Institute of Athens (EN)

Microelectronic Engineering (EN)

English

2001-09

DOI: 10.1016/S0167-9317(01)00547-0

Elsevier (EN)



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