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Internal stress in growing ZrO2 films
This item is provided by the institution :
National Technical University of Athens
Repository :
Digital Library of National Technical University of Athens | Dspace@NTUA
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ΕΚΤ item type
Journal part
(EN)
Scientific article
(EN)
EKT year
1991
(EN)
EKT historical period
Title
Internal stress in growing ZrO2 films (EN)
Creator
Panagopoulos, ChrN (EN)
Description
The anodic and open-circuit stresses were studied during the potentiostatic anodic oxidation of zirconium. The anodic stress, i.e. the superposition of growth and electrostrictive stresses, was found to be compressive whereas the open-circuit stress was found to be tensile in the growing zirconium oxide. For a constant value of anodization time, the anodic stress was observed to decrease and the opencircuit stress to increase with increasing thickness of the growing zirconium oxide. © 1991. (EN)
Type
journalArticle (EN)
Subject
Internal Stress (EN)
Stresses (EN)
Anodic Stress (EN)
Metallurgy & Metallurgical Engineering (EN)
Valve Metals (EN)
Chemistry, Physical (EN)
Zirconium and Alloys (EN)
Provider
National Technical University of Athens
Repository / collection
Digital Library of National Technical University of Athens | Dspace@NTUA
Subcollections
Κεντρική Βιβλιοθήκη Ε.Μ.Π.
Ιδρυματικό Αποθετήριο
Δημοσιεύσεις μελών Δ.Ε.Π. σε περιοδικά
Journal
Journal of The Less-Common Metals (EN)
Language
English
Issued
1991 (EN)
Identifier
http://hdl.handle.net/123456789/10466
0022-5088 (EN)
2 (EN)
168 (EN)
ISI:A1991FF60900004 (EN)
182 (EN)
10.1016/0022-5088(91)90299-J (EN)
175 (EN)
Publisher
ELSEVIER SCIENCE SA LAUSANNE (EN)
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