Bifurcation evolution across metal-metal contact sustaining high charge injection rates

 
δείτε την πρωτότυπη σελίδα τεκμηρίου
στον ιστότοπο του αποθετηρίου του φορέα για περισσότερες πληροφορίες και για να δείτε όλα τα ψηφιακά αρχεία του τεκμηρίου*
κοινοποιήστε το τεκμήριο




1994 (EL)

Bifurcation evolution across metal-metal contact sustaining high charge injection rates (EN)

Fitsilis, PT (EN)
Dervos, CT (EN)

In real world even the simplest of the electrical components may exhibit unpredictable characteristics, and it seems that the theory of chaos touches all disciplines. In this work, the contact potential instabilities induced by the high electronic injection rates between metal-to-metal contacts are experimentally investigated in an I-V phase space using state-of-the-art data logging systems. The mechanically contacted metals are energized by a sinusoidal power source, and their response is systematically studied within a 50-Hz cycle. The obtained results convincingly demonstrate their chaotic nature. Two entirely different instability types have been observed for such systems. Their classification may lead to a better understanding of negative differential resistance (NDR) formation, which is frequently observed across highly injecting interfaces. An equivalent circuit for the examined dynamic system is provided, and an effective test for the industrial no-load switching contacts is proposed. (EN)

journalArticle (EN)

Metal-metal contacts (EN)
Electric contacts (EN)
Materials Science, Multidisciplinary (EN)
Engineering, Electrical & Electronic (EN)
Electric connectors (EN)
Equivalent Circuit (EN)
Negative Differential Resistance (EN)
Chaos theory (EN)
Change injection (EN)
Interfaces (materials) (EN)
Dynamic System (EN)
Phase Space (EN)
Charge Injection (EN)
Engineering, Manufacturing (EN)
Bifurcation evolution (EN)
Equivalent circuits (EN)


IEEE transactions on components, packaging, and manufacturing technology. Part A (EN)

Αγγλική γλώσσα

1994 (EN)

10.1109/95.296412 (EN)
286 (EN)
2 (EN)
17 (EN)
1070-9886 (EN)
ISI:A1994NZ21800016 (EN)
294 (EN)

Publ by IEEE, Piscataway, NJ, United States (EN)




*Η εύρυθμη και αδιάλειπτη λειτουργία των διαδικτυακών διευθύνσεων των συλλογών (ψηφιακό αρχείο, καρτέλα τεκμηρίου στο αποθετήριο) είναι αποκλειστική ευθύνη των αντίστοιχων Φορέων περιεχομένου.