Simulation of reactive sputtering from a concentric dual-source magnetron in roll-to-roll coating processes

 
see the original item page
in the repository's web site and access all digital files if the item*
share




1994 (EN)
Simulation of reactive sputtering from a concentric dual-source magnetron in roll-to-roll coating processes (EN)

Avaritsiotis, J (EN)
Tsiogas, C (EN)

N/A (EN)

The performance of a magnetron system with two, electrically isolated concentric targets, which may be used for the deposition of reactively sputtered alloy metal oxide films has been simulated at relatively low pressures, using a steady state model which takes the specific system geometry into consideration. The proposed model not only allows for the calculation of the radial thickness and composition distributions of the growing film, but it also enables the investigation of the behaviour of the system when several process parameters are varied, making easier the optimization of its geometrical configuration, i.e. the selection of the inter-ring distances as well as the target-to-substrate separation. The simulation results for roll-to-roll coating using an indium-tin system, are in good agreement with experimental results reported by other investigators. © 1994. (EN)

journalArticle

Indium-tin system (EN)
Composition (EN)
Roll to roll coating (EN)
Oxides (EN)
Systems analysis (EN)
Alloy metal oxide films (EN)
Indium (EN)
Substrates (EN)
Film growth (EN)
Coating techniques (EN)
Geometry (EN)
Magnetrons (EN)
Reactive Sputtering (EN)
Electrically isolated concentric targets (EN)
Metallic films (EN)
Tin (EN)
Mathematical models (EN)
Reactive sputtering (EN)
Concentric dual source magnetron (EN)
Sputter deposition (EN)

Εθνικό Μετσόβιο Πολυτεχνείο (EL)
National Technical University of Athens (EN)

Vacuum (EN)

1994


PERGAMON-ELSEVIER SCIENCE LTD (EN)



*Institutions are responsible for keeping their URLs functional (digital file, item page in repository site)