Simultaneous emission of the HF and N2 lines from a plasma cathode tea laser

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1997 (EN)
Simultaneous emission of the HF and N2 lines from a plasma cathode tea laser (EN)

Papayannis, AD (EN)
Serafetinides, AA (EN)
Tsikrikas, GN (EN)
Atanasov, PA (EN)

N/A (EN)

Simultaneous laser action from HF and N2 is obtained, from a plasma cathode TEA laser, for the first time. The sliding discharge along the surface of a dielectric is used as a plasma cathode, for the main volumetric discharge. The laser operates at atmospheric pressure, with a gas mixture of SF6:C3H8:N2He. For a typical flow rate ratio of 0.27:0.024:0.2:19.8 lmin-1, it produces simultaneously 160 mJ HF and 0.6 mJ N2 laser outputs at 0.43% and 1.4×10-3% efficiencies respectively, at the moderate charging voltage of 28.5 kV. These output characteristics are obtained from a small active discharge volume and length of 106 cm3 and 38 cm respectively. These values extend the performance, recently reported in the literature, of a sliding discharge HF/N2laser with corresponding simultaneous energy outputs of 12 mJ HF and 1.1 mJ N2 , to a higher energy output level, thus making the device suitable for a broader range of applications. This novel dual wavelength HF/N2 laser system presented, can be particularly convenient for medical experiments, where the IR beam can be used for tissue ablation, while the UV beam can be used as the excitation source for fluorescence spectroscopic measurements, for the evaluation of the ablation process. Details are presented on the dependence of the laser performance parameters, such as output energy, discharge voltage and current and structure of the laser output pulses on the mixture composition and the circuit parameters. © 1997 IEEE. (EN)


Ultraviolet generation (EN)
N2 laser (EN)
HF laser (EN)
Gas lasers (EN)
Pulsed lasers (EN)

Εθνικό Μετσόβιο Πολυτεχνείο (EL)
National Technical University of Athens (EN)

IEEE Journal of Quantum Electronics (EN)



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