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Effects of MOCVD Thin Cobalt Films' Structure and Surface Characteristics on their Magnetic Behavior

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National Hellenic Research Foundation (NHRF)   

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Effects of MOCVD Thin Cobalt Films' Structure and Surface Characteristics on their Magnetic Behavior
Hristoforou, Evangelos
Papadopoulos, Nikolaos
Σαραντοπούλου, Ευαγγελία
Karayianni, Chaido-Stefania
Tsakiridis, Petros
Άρθρο σε επιστημονικό περιοδικό
2011-09
Cobalt thin films are deposited by metal-organic (MO) CVD, under various experimental conditions, on Si and SiO(2) substrates. The precursors used are cobalt nitrosyl tricarbonyl, Co(CO)(3)NO, cobalt acetylacetonate, Co(acac)(2), and cobalt carbonyl, Co(2)(CO)(8). Emphasis is given to the delivery method of each precursor, especially to a new technique of aerosol delivery. The films are thoroughly examined in terms of microstructure and surface morphology in order to establish relevance to magnetic properties. It is found that Co films deposited from Co(2)(CO)(8) dissolved in dichloromethane are characterized by a high degree of planarity and purity, while exhibiting a non-hysteretic giant magnetoresistance (GMR) behavior in the presence of an externally applied magnetic field normal to their surface.
Malden
Φυσική (EL)
Χημεία (Γενικά) (EL)
Επιστήμη (Γενικά) (EL)
Τεχνολογία (Γενικά) (EL)
Technology (General) (EN)
Science (General) (EN)
Chemistry (General) (EN)
Physics (EN)
Magnetization
Precursors
Materials Science, Coatings & Films
Aerosol Delivery
Electrochemistry
Physics, Condensed Matter
Cobalt
MOCVD
Thin Films
English
Wiley-blackwell
Chemical Vapor Deposition
National Hellenic Research Foundation (NHRF)
Helios - Repository of the National Hellenic Research Foundation (NHRF)



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