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Realization and simulation of high aspect ratio micro/nano structures by proton beam writing

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Realization and simulation of high aspect ratio micro/nano structures by proton beam writing (EN)
Βαλαμόντες, Ευάγγελος Σ. (EL)
Χατζηχρηστίδη, Μαργαρίτα (EL)
Ράπτης, Ιωάννης Α. (EL)
Van Kan, Jeroen Anton (EN)
Watt, Frank R. (EN)
conferenceItem
poster
2015-05-17T19:42:02Z
2015-05-17
2007
20th International Microprocesses and Nanotechnology Conference, MNC 2007 (EN)
In this paper, proton beam writing is combined with an aqueous developable-easily stripped negative chemically amplified resist (TADEP: thick aqueous developable epoxy resist) for the realization of high aspect ratio structures. Monte Carlo method is used to simulate PBW in thick resist films. Result shows that resist structures with 280 nm linewidth and aspect ratio of 40 were easily resolved. (EN)
Electrical engineering
**N/A**-Τεχνολογία
Fluid mechanics
http://zbw.eu/stw/descriptor/18426-4
Photoresistors
Ηλεκτρολυτική
Φωτοαντιστάσεις
http://id.loc.gov/authorities/subjects/sh85049383
Electroplating
Βελτιστοποίηση
Optimization
Τεχνολογία
Πτώση πίεσης
http://id.loc.gov/authorities/subjects/sh85101408
http://id.loc.gov/authorities/subjects/sh88004614
**N/A**-Ηλεκτρολογία Μηχανολογία
Ηλεκτρολογία Μηχανολογία
Structural optimization
Technology
Pressure drop
http://skos.um.es/unesco6/330310
Μηχανική ρευστών
http://id.loc.gov/authorities/subjects/sh85133147
Διαρθρωτική βελτιστοποίηση
IEEE (EN)
http://ieeexplore.ieee.org/
Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες
http://creativecommons.org/licenses/by-nc-nd/3.0/us/
forever
Technological Educational Institute of Athens
Ypatia - Institutional Repository
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