Electron Beam writing process is essential for EUV mask manufacturing and direct writing. Electron beam lithography simulation tools can provide critical information in the way of obtaining high accuracy results. In the present work a software tool which performs e-beam writing simulation, resist development simulation and automated metrology has been developed and applied in the case of Mo/Si multilayer substrates. Simulation results are compared with experimental ones in order to evaluate the simulation's accuracy.
(EN)
24th European Mask and Lithography Conference
(EN)
**N/A**-Τεχνολογία
Ηλεκτρονική
Ultraviolet rays
http://id.loc.gov/authorities/subjects/sh85042383
Δέσμες ηλεκτρονίων
Electronics
Μετρολογία
Τεχνολογία
Υπεριώδεις ακτίνες
Electron beams
Technology
**N/A**-Ηλεκτρονική
Metrology
http://id.loc.gov/authorities/subjects/sh85133147
SPIE
(EN)
http://proceedings.spiedigitallibrary.org
Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες
