A reactive sputtering process model for symmetrical planar diode systems

 
δείτε την πρωτότυπη σελίδα τεκμηρίου
στον ιστότοπο του αποθετηρίου του φορέα για περισσότερες πληροφορίες και για να δείτε όλα τα ψηφιακά αρχεία του τεκμηρίου*
κοινοποιήστε το τεκμήριο




1992 (EL)

A reactive sputtering process model for symmetrical planar diode systems (EN)

Tsiogas, CD (EN)
Avaritsiotis, JN (EN)

A quantitative model for the reactive sputtering process in a symmetrical planar configuration is presented which takes specific system geometry into consideration. Scattering effects have been included using a Monte Carlo approach. The model allows for the calculation of the radial compositional distribution of the growing film as a function of the distance between the target and the condensation surface, further to the simulation of the well-known hysteresis effect and its consequences in the composition of the deposited film. One of the main features of the proposed model is that it offers the possibility of introducing a reactive gas profile across the reaction zone (instead of considering it to be constant), to account for the gettering action of both target and condensation surface at relatively high sputtering rates and short target-to-substrate separations. Calculated results concerning system stability have been found to be in good qualitative agreement with experimental results published in the literature. © 1992. (EN)

journalArticle (EN)

Mathematical Statistics--Monte Carlo Methods (EN)
Films--Preparation (EN)
Reactive Sputtering (EN)
Process Model (EN)
Materials Science, Coatings & Films (EN)
Materials Science, Multidisciplinary (EN)
Semiconductor Diodes (EN)
Planar Diode Systems (EN)
Physics, Condensed Matter (EN)
Metals And Alloys (EN)
Physics, Applied (EN)


Thin Solid Films (EN)

Αγγλική γλώσσα

1992 (EN)

1 (EN)
25 (EN)
10.1016/0040-6090(92)90004-U (EN)
17 (EN)
ISI:A1992HL63500003 (EN)
209 (EN)
0040-6090 (EN)

ELSEVIER SCIENCE SA LAUSANNE (EN)




*Η εύρυθμη και αδιάλειπτη λειτουργία των διαδικτυακών διευθύνσεων των συλλογών (ψηφιακό αρχείο, καρτέλα τεκμηρίου στο αποθετήριο) είναι αποκλειστική ευθύνη των αντίστοιχων Φορέων περιεχομένου.