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Electronic structure and band - gap study of Si1-xCx
This item is provided by the institution :
National Technical University of Athens
Repository :
Digital Library of National Technical University of Athens | Dspace@NTUA
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ΕΚΤ item type
Journal part
(EN)
Scientific article
(EN)
EKT year
1993
(EN)
EKT historical period
Title
Electronic structure and band - gap study of Si1-xCx (EN)
Creator
Xanthakis, JP (EN)
Description
The electronic structure of Si1-xCx has been calculated, in the region x > 0.5 in terms of x, the ratio of sp2 sites a and the short-range order parameters. By comparing Eg(x) to the experimental gaps we deduce that in the low hydrogenation limit the material is close to chemical order and that for high a, Eg (x) displays a hump, whereas at low a it is monotonic. © 1993. (EN)
Type
journalArticle (EN)
Subject
Electronic Structure (EN)
Band structure (EN)
Electronic properties (EN)
Band Gap (EN)
Materials Science, Ceramics (EN)
Materials Science, Multidisciplinary (EN)
Solid state physics (EN)
Amorphous materials (EN)
Chemical order (EN)
Electronic structure (EN)
Silicon carbide (EN)
Band gap (EN)
Low hydrogenation limit (EN)
Provider
National Technical University of Athens
Repository / collection
Digital Library of National Technical University of Athens | Dspace@NTUA
Subcollections
Κεντρική Βιβλιοθήκη Ε.Μ.Π.
Ιδρυματικό Αποθετήριο
Δημοσιεύσεις μελών Δ.Ε.Π. σε περιοδικά
Journal
Journal of Non-Crystalline Solids (EN)
Language
English
Issued
1993 (EN)
Identifier
http://hdl.handle.net/123456789/10948
1019 (EN)
1022 (EN)
164-166 (EN)
PART 2 (EN)
0022-3093 (EN)
ISI:A1993MT78200090 (EN)
10.1016/0022-3093(93)91171-X (EN)
Publisher
ELSEVIER SCIENCE BV (EN)
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